Patents

<p><strong>US Patent 6504235</strong> - Passivation layer and process for semiconductor devices<br /> Method of coating semiconductor devices that prevented parametric shift in electrical performance. Solved key processing problem.</p> <p><strong>US Patent 4440108</strong> - Ion Beam Deposition Apparatus<br /> Design of equipment for deposition of thin films in the presence of ion bombardment. System produced thin films of interest for mechanical, electrical and optical properties and was sold as an equipment product.</p> <p><strong>US Patent 6525880</strong> - Integrated Tunable Fabry-Perot filter and Method of Making Same<br /> Design and method for fabricating very small, very high performance variable optical filter using semiconductor fabrication technology. In current use in fiber optical networks, chemical sensors, and 3-D medical imaging applications.</p> <p><strong>US Patent 5175020</strong> - Boron Nitride Films and Process of Making Same<br /> Ion assisted deposition of ultra-hard cubic boron nitride films for semiconductor and machine tool applications. Significant use in both areas.</p> <p><strong>US Patent </strong><strong>4526673</strong> - Coating Method<br /> Method for deposition of thin films used in semiconductor device fabrication. Method based on direct control of the kinetics of thin film deposition.</p> <p><strong>US Patent Application 2007/00254411</strong> - Systems and Methods for High Density Multi-Component Modules<br /> Method for fabrication of electronic modules using multiple thinned integrated circuits, patterned multi-level interconnects, passive electronic components, and sensors</p> <p><strong>US Patent Application 2009/TBD</strong> - Devices, systems, and methods for controlling the temperature of resonant elements<br /> Devices and systems for achieving low phase noise crystal oscillators using unique low power thermoelectric structures</p>